FABRICATION OF PhC STRUCTURES BY USING NANOIMPRINT LITHOGRAPHY AND THEIR OPTICAL PROPERTIES

  • Juraj Nevrela Institute of Electronics and Photonics Slovak University of Technology in Bratislava
  • Anton Kuzma Institute of Electronics and Photonics Slovak University of Technology in Bratislava
Keywords: PhC, nanostructure, NIL, hard stamp, UV-exposure, next generation of nanoscale lithography, RCWA, LED, RIE, AFM

Abstract

The contribution deals with creating structure, which have unique properties for influencing the spectrum of light. Since these structures exhibit the period under the diffraction limit of visible light or UV radiation, they can’t be fabricated by standard photolithography. As a result, this nanoscale structure must be prepared with progressive nanostructure patterning technology known as nanoimprint lithography (NIL). Especially, in our work UV-nanoimprint lithography was used. Considering preservation of low production costs, which plays a crucial role in the industry, the UV-nanoimprint lithography will be best suit for this purpose. Using this technology result with respect to reproducibility and uniformity of created nanostructure has been achieved. Ability of influencing light spectrum for nanostructures with the period of 800 nm and 600 nm with various feature size were presented with observation and simulation also.

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Author Biographies

Juraj Nevrela, Institute of Electronics and Photonics Slovak University of Technology in Bratislava

PhD Student

Faculty of Electrical Engineering and Information

Anton Kuzma, Institute of Electronics and Photonics Slovak University of Technology in Bratislava

PhD

Faculty of Electrical Engineering and Information

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Published
2019-11-26
How to Cite
Nevrela, J., & Kuzma, A. (2019). FABRICATION OF PhC STRUCTURES BY USING NANOIMPRINT LITHOGRAPHY AND THEIR OPTICAL PROPERTIES. Technology Transfer: Fundamental Principles and Innovative Technical Solutions, 29-31. https://doi.org/10.21303/2585-6847.2019.001020
Section
Fundamental and Applied Physics